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Joseph O'neill
Chelsea International Photography Competition Exhibition
Agora Gallery
530 West 25th StreetNew York,NY
Previous Artist
  • Refraction 2
Digital on Fine Art Paper
17" x 11" 

    Refraction 2

    Digital on Fine Art Paper
    17" x 11"
  • X
Digital on Fine Art Paper
17" x 11" 

    X

    Digital on Fine Art Paper
    17" x 11"
  • Remembrance
Digital on Hahnemühle Paper
13" x 19" 

    Remembrance

    Digital on Hahnemühle Paper
    13" x 19"
  • Remembrance 4
Digital on Hahnemühle Paper
13" x 19" 

    Remembrance 4

    Digital on Hahnemühle Paper
    13" x 19"
  • Triangles 3
Digital on Hahnemühle Paper
13" x 19" 

    Triangles 3

    Digital on Hahnemühle Paper
    13" x 19"
Next Artist

JOSEPH O'NEILL

Chelsea International Photography Competition Exhibition
February 19 – February 28, 2019
Reception: Thursday, February 21, 2019 6-8 PM


Artist Joseph O’Neill is known for his digital, abstract works with stark black-and-white geometric shapes. He uses the sides of buildings, refracted light, and muted digital forms to create striking compositions marked by all-over patterns. Eliminating the context of his surroundings, O’Neill asks us to focus on intricate patterns that we’d otherwise miss, like those we see in Refraction 2 and X. His minimalist works reveal the simplicity of the world around us, squares and triangles stacked on top of one another to create a structured whole.






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